Professor Davinder Kaur Research Group
                Indian Institute of Technology Roorkee

ELECTRON BEAM (E-Beam) EVAPORATION

 [Hind Hi Vacuum System India]

E-Beam or Electron Beam Evaporation is a form of Physical Vapor Deposition in which the target material is bombarded with an electron beam from a charged tungsten filament to evaporate and convert it to a gaseous state for deposition on the material to be coated. Atoms or molecules in a vapor phase then precipitate and form a thin film coating on the substrate in a high vacuum chamber. It permits the direct transfer of energy with the Electron Beam to the target material to be evaporated making it ideal for metals with high melting points. Electron Beam Evaporation can yield significantly higher deposition rates - from 0.1 nm per minute to 100 nm per minute - resulting in higher density film coatings with increased adhesion to the substrate. Because of the high deposition rate and high material utilization efficiency, E-Beam Evaporation is used in a wide variety of applications ranging from high performance aerospace and automotive industries.